项目名称: 基于光机械多探针原理的广域薄膜表面形貌测量方法研究
项目编号: No.51205043
项目类型: 青年科学基金项目
立项/批准年度: 2013
项目学科: 机械工程学科
项目作者: 刘淑杰
作者单位: 大连理工大学
项目金额: 25万元
中文摘要: 光刻技术在半导体产业微细化,高集成化进程中有着极其重要的作用,本项目的研究就是针对下一代短波光刻技术中必不可少的光刻胶薄膜表面形貌的高速、高精度测量所提议的新一代测量理论及测量方法的研究。本项目的研究目的是提出并建立广域光刻胶表面形貌的高精度测量理论和方法。传统的表面测量方法很难实现本课题中光刻胶薄膜的测量要求,为了解决这个问题,本研究提出应用光学测量和机械接触相结合的理论来进行测量。我们曾经应用一维线性排列的光-机械多探针传感器进行了基础研究,证明了此方法测量透明半透明薄膜的可行性。但在纳米领域里作为测量难点的三维形状测量方法还有很多理论和技术挑战。在此,我们重点研究光-二维网格多探针传感器的扫描型测量方法及多点测量误差分离理论,以实现光刻胶表面的三维高精度,高速形貌测量。应用所研发光-机械探针传感器,建立扫描型广域表面形貌测量装置,通过基础实验分析对新测量理论及测量仪器进行有效性评价。
中文关键词: 光-接触探针;薄膜形状测量;误差分离;二维网状探针;MEMS技术
英文摘要: In the semiconductor industry, a device that can measure the surface profile of thin film like photoresist with high accuracy and high speed is needed. Here, the problem is that photoresist is less than 500 nm thick. When we measure it with the light scanning method directly, multiple interferences and reflections of the thin film obstruct the profile measurement with optical noise, making correct measurement impossible. As another approach, atomic force microscopy (AFM) can be used to take measurements by a probe with high accuracy. However, if the measured object is softer than the AFM stylus tip, the tip may deform it during the measurement, and the speed is limited because AFM is used in micro-area measurements. Since the photoresist surface is deformable and smooth, the measurement device must not damage it during the measurement, and the resolution in the horizontal direction must be in tens of micrometers. In the last research, we developed an apparatus using a multi-ball cantilever and white light interferometer to measure the surface profile of thin film. The results demonstrated the feasibility of the constructed multi-ball cantilever system for measuring thin film with high accuracy. In this research we will be important in the surface measurement method using square-pattern probes and white light int
英文关键词: mechano-opto-sensor;photoresist measurement;error-separation;square-pattern probe;MEMS technology