Particle beam microscopy (PBM) performs nanoscale imaging by pixelwise capture of scalar values representing noisy measurements of the response from secondary electrons (SEs) integrated over a dwell time. Extended to metrology, goals include estimating SE yield at each pixel and detecting differences in SE yield across pixels; obstacles include shot noise in the particle source as well as lack of knowledge of and variability in the instrument response to single SEs. A recently introduced time-resolved measurement paradigm promises mitigation of source shot noise, but its analysis and development have been largely limited to estimation problems under an idealization in which SE bursts are directly and perfectly counted. Here, analyses are extended to error exponents in feature detection problems and to degraded measurements that are representative of actual instrument behavior for estimation problems. For estimation from idealized SE counts, insights on existing estimators and a superior estimator are also provided. For estimation in a realistic PBM imaging scenario, extensions to the idealized model are introduced, methods for model parameter extraction are discussed, and large improvements from time-resolved data are presented.
翻译:粒子射线显微镜(PBM)通过像素方法捕捉标量值来进行纳米规模成像,这些标的标值代表连续一段时间内合成的二次电子反应的噪音测量。 扩展到计量学, 目标包括估计每个像素的SE产量和检测像素中SE产量的差异; 障碍包括粒子源中的射出的噪音,以及对于单个SE的仪器反应缺乏了解和变异性。 最近推出的一个时间破解的测量范式保证减少源射出的噪音,但其分析和开发主要限于估计在SE爆发直接和完全计算的理想化下出现的问题。 在这里,分析扩大到特征探测问题中的错误和代表估计问题的实际仪器行为的退化测量。 关于理想化的SE计算,还提供了关于现有估计器的洞察力和高级估计器。 关于现实的PBM成像情景的估计,引入了对理想化模型的扩展,讨论了模型参数提取方法,并介绍了时间解析数据的巨大改进。</s>