超大数值孔径正交位相光栅横向剪切干涉关键技术基础研究

项目名称： 超大数值孔径正交位相光栅横向剪切干涉关键技术基础研究

项目编号： No.61205164

项目类型： 青年科学基金项目

立项/批准年度： 2013

项目学科： 信息四处

项目作者： 刘克

作者单位： 北京理工大学

项目金额： 28万元

中文摘要： 面向45nm-32nm技术节点的超大数值孔径ArF光刻物镜必须采用高精度的像差实时在线检测技术以保证光刻机集成和运行维护的性能。本项目面向国家中长期科技发展规划的长远目标，研究45-32nm技术节点超大数值孔径ArF光刻物镜的像差检测理论和技术基础。针对超大数值孔径ArF光刻物镜波像差在线检测的需求，提出了一种新的正交位相光栅横向剪切干涉技术。本项目结合理论和实验研究两种途径，研究提高正交位相光栅横向剪切干涉技术检测精度的关键技术，主要包括对系统误差校准、精密对准和四光束剪切干涉图处理技术，建立可见光波段正交位相光栅横向剪切干涉实验系统，实现关键技术的原理验证。项目内容具有基础性和前瞻性，为我国45nm-32nm浸没式光刻物镜的研发和光刻机整机集成提供高精度像差检测理论和技术基础。

中文关键词： 超大数值孔径光刻物镜；波像差测量；剪切干涉；系统误差校准；波前重构

英文摘要： In order to ensure the integration, operation and maintenance performance of lithography tool, high accuracy in situ aberration measurement technique is nessary in hyper numerical aperture ArF projection optics facing 45nm-32nm technology nodes. This project aims at the long term objective of national technology development plan. The theoretical and technical basis of aberration measurement for hyper numerical apertrue ArF projection optics will be studied in this project. A novel cross phase grating lateral shearing interferometer(CPGLSI), which meets the in situ aberration measurement requirements of hyper numerical projection optics, has been proposed and will be studied in both theoretical and experimental ways. In this project, the CPGLSI critical techniques, which can improve the measurement accuracy of CPGLSI, will be studied. The critical techniques include systematic error calibration, high precision alignment and inteferogram processing. In order to achieve experimental verification of the aboved critical techniques, a visible light CPGLSI experiment system will be developed. The research issues in this project are fundamental and prospective. In conlcusion, some theoretical and technical basis of high accuracy in situ aberration measurement for 45nm-32nm nodes immersion lithographic projection optics

英文关键词： hyper numerical aperture objective；wavefront error measurement；shearing interferometry；systematic error calibration；wavefront reconstruction