基于LCoS的面曝光微小零件快速成形关键技术研究

项目名称： 基于LCoS的面曝光微小零件快速成形关键技术研究

项目编号： No.50875194

项目类型： 面上项目

立项/批准年度： 2009

项目学科： 武器工业

项目作者： 胥光申

作者单位： 西安工程大学

项目金额： 36万元

中文摘要： 实现了以反射型液晶光阀LCoS为核心构建高分辨率动态视图发生器，利用视图发生器产生的零件截面视图作为掩膜，对树脂整层曝光选择性固化，实现微小结构制作的新型低成本高分辨率快速成形方法，并对该技术涉及的整层曝光工艺、变形机理及新型曝光模式等关键技术进行研究。通过对光源与光敏树脂的匹配性研究，选择了合适的光敏树脂；通过对视图平面内紫外光能分布研究，实现了光能量分布的均匀化；通过对视图畸变进行校正研究，提高了视图生成质量。通过对树脂的固化特性研究，建立了树脂的固化模型。建立了面曝光快速成形中变形的挠度方程；利用有限元方法对面曝光快速成形中的变形进行了模拟研究；并对变形与影响因素间的关系进行了实验研究，揭示了面曝光快速成形的变形机理。对新型曝光固化模式进行了研究，结果显示：采用新型曝光模式，可显著降低成形过程出现的变形。对整层曝光快速成形系统制作参数进行了优化研究，得到了最佳制作参数组合，提高了制作精度。对适用于整层曝光快速成形系统的直接切层方法进行了研究，实现了利用SolidWorks对三维模型的直接切层。以上研究为开发适用于微小结构制作的快速成形技术提供了基础。

中文关键词： 快速成形；视图发生器；LCoS器件；高分辨率

英文摘要： In order to fabricate micro/meso structures, a novel high-resolution integral stereolithography (SL) system with dynamic pattern generator using Liquid Crystal on Silicon (LCoS) has been set up. The SL system solidifies photo-sensitive resin with image mask generated by dynamic pattern generator. And related technologies such as resin solidification process, deform mechanism in fabrication and new exposure mode have been investigated. Researches have been carried out to find the matching character of light source of integral SL System and the photo-curable resin, and ad2230 is the right photo-curable resin for the integral SL system. Investigation of UV light intensity distribution of integral SL system has been performed, and uniformity UV light intensity distribution is obtained in the imaging plane.Researches of distortion correction of image in the SL system are carried out, and the experimental results indicate that the geometric distortion of the image in integral SL system has been eliminated remarkably. Investigation of solidification characteristics of resin for integral SL system is implemented, and solidification characteristics model of the photo-curable resin UV-2230, which describes the resin's dynamic characteristics in solidifying process, is established with least square method in experiments. The deformation of integral SL is analyzed, a little deflection temperature stress bending differential equation, which describe the relationship of deformation with other parameters in integral SL System, is established with elastic mechanics. The relationship of distortion deformation with relating factors is obtained through the equation, and the relationship also is researched with experiment. The deformation is simulated with FEM. Novel exposure models are investigated, and the research results show that the deformation decreases with new exposure models. Experimental investigation has been conducted to determine the optimum build parameters of integral SL system with Taguchi method, and confirmation experiment results indicated that the dimension accuracy has been significantly improved with the optimum factors combination. According to the requirements of integral SL System, new direct slicing methods with SolidWorks for integral SL System are developed. The researches mentioned above lay a foundation for development new integral SL System for build micro-structure at lost cost.

英文关键词： Integral stereolithography；Pattern generator；Liquid crystal on silicon (LCoS)；High-resolution