This paper presents an automatic layout generation framework in advanced CMOS technologies. The framework extends the template-and-grid-based layout generation methodology with the following additional techniques applied to produce optimal layouts more effectively. First, layout templates and grids are dynamically created and adjusted during runtime to serve various structural, functional, and design requirements. Virtual instances support the dynamic template-and-grid-based layout generation process. The framework also implements various post-processing functions to handle process-specific requirements efficiently. The post-processing functions include cut/dummy pattern generation and multiple-patterning adjustment. The generator description capability is enhanced with circular grid indexing/slicing and conditional conversion operators. The layout generation framework is applied to various design examples and generates DRC/LVS clean layouts automatically in multiple CMOS technologies.
翻译:本文件介绍了先进的 CMOS 技术的自动布局生成框架。框架扩展了基于模板和网络的布局生成方法,并采用了以下额外技术来更有效地制作最佳布局。首先,布局模板和网格在运行期间动态创建和调整,以满足各种结构、功能和设计要求。虚拟实例支持动态模板和网络布局生成程序。框架还实施各种后处理功能,以高效处理流程特定需求。后处理功能包括切割/模拟模式生成和多模式调整。发电机描述能力通过循环电网索引/切换和有条件转换操作器得到加强。布局生成框架应用于各种设计实例,并在多个 CMOS 技术中自动生成DRC/LVS 清洁布局。