用于惯性约束聚变靶丸材料的B-C-N薄膜的ECR-PLD制备及其结构控制

项目名称： 用于惯性约束聚变靶丸材料的B-C-N薄膜的ECR-PLD制备及其结构控制

项目编号： No.51272196

项目类型： 面上项目

立项/批准年度： 2013

项目学科： 一般工业技术

项目作者： 张联盟

作者单位： 武汉理工大学

项目金额： 80万元

中文摘要： 针对惯性约束聚变对新型靶丸材料的需求，项目以电子回旋共振微波等离子体增强脉冲激光沉积（ECR-PLD）技术制备B-C-N薄膜及其结构控制为研究目标，系统研究ECR-PLD工艺参数对B-C-N薄膜的沉积速率和表面形貌的影响，通过优化沉积工艺和调整沉积时间实现对其厚度和表面质量的准确控制；重点研究B-C复合靶组分和ECR-PLD工艺参数对B-C-N薄膜物相组成、化学结构和杂化状态及其成分的影响，通过调整ECR微波功率和氮气分压，实现B-C-N薄膜中B、C、N的原子级化合及其成分的准确控制；系统测试B-C-N薄膜的力学和光学性能，研究薄膜成分、结构与其性能之间的相关性；最终制备出具有精确化学组成、单一物相结构和均匀成分分布以及厚度均匀、表面平整的B-C-N薄膜，并阐明在ECR微波等离子体和激光烧蚀等离子体的耦合作用下，B-C-N薄膜的物理-化学生长过程、成膜机理以及成膜原子之间的反应机制。

中文关键词： B-C-N薄膜；成分控制；结构解析；力学性能；

英文摘要： The purpose of the present work is to prepare boron carbon nitride (B-C-N) thin films by Electron Cyclotron Resonance plasma assisted Pulsed Laser Deposition (ECR-PLD) for the requirement of new target materials used in the National Ignition Facility (NIF). The preparation process and structural control of the as-deposited films will be investigated. The effect of ECR-PLD parameters on the deposition rate and surface morphology of the films will be discussed in order to obtain B-C-N thin films with controllable thickness and surface. The effects of B-C target compositions and ECR-PLD parameters on the phase composition, chemical structure, bond state and composition of the films will be mainly studied to form the ternary B-C-N compounds. The mechanical and optical properties of the films will be further tested, and the relationship between composition, structure and property will be established. Finally, single-phased B-C-N thin films with the controllable chemical composition, homogeneous composition distribution, uniform thickness and smooth surface are expected to be obtained. Under the coupling action between ECR plasma and laser-ablation plasma, the physical - chemical growth process and formation of the B-C-N thin films as well as the reaction mechanism of B, C, N atoms, will be interpreted.

英文关键词： B-C-N thin films；Composition control；Structure analysis；Mechanical property；