图的谱方法及其在纳米尺度集成电路分析优化中的应用

项目名称： 图的谱方法及其在纳米尺度集成电路分析优化中的应用

项目编号： No.61474026

项目类型： 面上项目

立项/批准年度： 2015

项目学科： 无线电电子学、电信技术

项目作者： 杨帆

作者单位： 复旦大学

项目金额： 70万元

中文摘要： 随着集成电路特征尺寸的缩小和集成度的增加，集成电路设计优化处理问题规模不断膨胀，需要借助层次化方法来降低计算复杂度，提升处理问题规模。同时由于光刻所用光源的波长未显著减小，集成电路也面临光刻分辨率方面的挑战。本课题提出利用图的谱方法来解决集成电路层次化构建、光刻热点检测、多次曝光工艺版图分解问题。(1) 提出快速可并行的谱聚类方法，应用于层次化的集成电路分析优化。相比已有启发式算法，聚合结果更精确，具有数学理论支撑。(2) 提出利用谱聚类方法快速提取版图中关键特征图，并将图的谱作为支持向量机特征来检测关键特征图，实现光刻热点检测。 (3) 提出利用图的谱理论中的最小染色数的界，在设计早期衡量版图是否适合多次曝光工艺。并提出用谱聚类方法求解多次曝光版图分解的染色问题。这些新理论和新方法不仅将有效提升上述集成电路设计自动化问题的求解效率，同时对图的谱分析理论和方法的发展也具有重要意义。

中文关键词： 谱分析；谱聚类；层次化分析；光刻热点检测；多次曝光版图分解

英文摘要： As the feature size continues to shrink, more than one billions of transistors are integrated in a single chip. The analysis and optimization tools for integrated circuits should have the capacity to deal with the problems in the scale of one hundred millions. A variety of analysis and optimization tools have employed the multi-level or hierarchical strategy to improve the capacity of the tools. On the other hand, since the wavelength of the lithography has not been significantly reduced, the integrated circuits also encounter the challenges of lower resolution of the lithography process. In this project, we propose to employ the idea of spectral analysis and spectral clustering methods from the spectral theory of graph to handle the problems of multi-level simulation/optimization, lithograph hotspot detection, layout decomposition of multiple patterning lithography. (1) We propose a fast and parallel spectral clustering to build the hierarchy of the large-scale circuits to improve the efficiency of circuit simulation/optimization. Compared with the traditional heuristic methods, the spectral clustering method can achieve more accurate and nature hierarchy with the support of mathematical theory. (2) We propose to employ the spectral clustering method to extract the critical features of the layout, and use the spectrum of the critical feature graph as the feature to build the SVM (Support Vector Machine), and thus realize the detection method for lithograph hotspots. (3) We propose to take the chromatic number bounds obtained from the spectral theory of the graphs as the criteria to judge whether the layout is suitable for the multiple patterning lithography. We also propose to use the spectral clustering method to solve the coloring problem of multiple patterning lithography. These new theory and methods not only significantly improve the efficiency of solving the aforementioned problems, but also contribute to the spectral theory for graphs.

英文关键词： spectral analysis;spectral clustering;hierarchial analysis;hotspot detection;layout decomposition for multiple patterning lithography