项目名称: 双栅纳米FinFET的器件物理,模拟模型和电路设计技术研究
项目编号: No.60876027
项目类型: 面上项目
立项/批准年度: 2009
项目学科: 轻工业、手工业
项目作者: 何进
作者单位: 北京大学
项目金额: 39万元
中文摘要: 2006年ITRS预计:2016年左右以双栅纳米FinFET为代表的非传统CMOS可能代替体硅结构用于亚22nm节点后的集成电路技术代. 如此的技术进步对纳米FinFET的研究提出了巨大挑战: 一是目前还无完整清晰的纳米FinFET器件物理理论; 二是诸多独特物理效应复杂化了电路模拟SPICE模型的建立;三是并不清楚已有的电路设计技术和方法是否适用纳米FinFET的CMOS电路. 基于此, 我们提出"双栅纳米FinFET的器件物理,模拟模型和电路设计技术研究"项目,争取2-3年内在纳米FinFET的器件物理, 模拟模型和相应的电路设计技术上有突破性进展: 建立国际创新性的双栅纳米FinFET载流子器件物理理论;实现FinFET新效应在该理论框架内自洽集成的电路SPICE模型;发展FinFET电路结构的设计验证平台; 研究以FinFET为基本结构单元的新电路拓扑和电路设计新技术。
中文关键词: 双栅纳米FinFET;器件物理;模拟和模型;电路CAD;电路设计技术
英文摘要: Non-classical CMOS such as double-gate (DG) nano-scale FinFET is very promising candidate for bulk silicon technology. According to the International Technology Roadmap for Semiconductors (ITRS) in 2006, DG FinFET will probably be applied to the integrated circuits design for 22nm technology node since 2016. Such a great progress in technology at the same time brought many challenges for the nano-scale FinFET research. On one hand, a more complete and expicit device physics theory for nano-scale FinFET is not available up to now. On the other hand, additional new physical effects in FinFET lead to the complexity of SPICE model development for circuit simulation. Furthermore, the current technology for circuit design needs to be confirmed whether it is valid for FinFET based circuit or not. Under such a background, we proposed the project "The device physics, modeling and circuit design technology research for double-gate nano-scale FinFET" to arrive at the following achievements in two or three years: 1)Build a novel device physics theory for DG FinFET; 2) Self-consistently integrate the new physical effects in FinFET with the proposed SPICE model; 3) Establish a platform for circuit design and benchmark; 4) Investigate new circuit topology and new circuit design techniques based on FinFET units.
英文关键词: double-gate nano-scale FinFET; device physics; simulation and modeling; circuit CAD; circuit design technology