项目名称: 金属微结构阵列表面的二次电子能谱特性研究
项目编号: No.61501364
项目类型: 青年科学基金项目
立项/批准年度: 2016
项目学科: 无线电电子学、电信技术
项目作者: 叶鸣
作者单位: 西安交通大学
项目金额: 23万元
中文摘要: 金属表面二次电子产额的抑制在提高空间微波器件、真空电子器件、粒子加速器等器件/系统性能方面具有重要应用,利用微结构阵列表面实现二次电子产额抑制的研究近年来取得了显著进展。然而,对微结构阵列表面二次电子能谱特性却缺乏了解,构成了准确评估其实际应用效果的瓶颈。为此,本项目将系统研究微结构阵列表面的二次电子能谱特性,建立其唯象模型并评估其对微放电特性的影响。基于准确的平滑表面二次电子发射唯象模型,结合蒙特卡罗模拟建立微结构阵列表面的二次电子能谱特性计算方法;系统研究微结构形状尺寸、初始电子入射参数等因素对二次电子能谱特性的影响,建立微结构阵列表面二次电子能谱唯象模型,评估二次电子能谱对平行板波导微放电特性的影响;通过光刻等工艺制备金属微结构阵列表面并测试其二次电子能谱特性,优化理论计算方法及其二次电子能谱唯象模型。研究成果对于应用微结构阵列表面提高微波器件等的可靠性具有重要科学意义和实用价值。
中文关键词: 电子发射;二次电子能谱;微结构阵列;微放电
英文摘要: Suppression of secondary electron yield of metal surfaces is known to be efficient in improving performance of devices/systems such as microwave devices, vacuum electronic devices and accelerators. In recent years, microstructure array surfaces have been widely used in secondary electron yield suppression. However, the secondary electron spectrum characteristic of microstructure array surface is still unclear and thus it becomes a bottleneck in evaluating performance improvement by using microstructure array surface in real devices/systems. So, in this project, we will study the secondary electron spectrum of microstructure array surface, its phenomenological model and we will also clarify how it influences multipactor behavior of microwave devices. First, based on the accurate phenomenological model of secondary electron emission of metal plate, we will establish the calculation method of secondary electron spectrum of microstructure array surface using Monte Carlo simulation. Second, we will study the relation between secondary electron spectrum and its influence factors such as microstructure’s shape and size, incident energy and angle of primary electrons. And then, we will derive a phenomenological model describing secondary electron spectrum characteristic of microstructure array surface and study the secondary electron spectrum characteristic dependence of multipactor region of parallel plate waveguide. Last, we will fabricate microstructure array surface samples by process such as photolithography and measure their secondary electron emission properties as a validation of the established calculation method and phenomenological model. This project will have scientific and applied significance in improving reliability of devices/systems such as microwave devices using microstructure array surface.
英文关键词: electron emission;secondary electron spectrum;microstructure array;multipactor