超净表面制备中纳米颗粒的行为机制研究

项目名称： 超净表面制备中纳米颗粒的行为机制研究

项目编号： No.51205006

项目类型： 青年科学基金项目

立项/批准年度： 2013

项目学科： 机械工程学科

项目作者： 黄雅婷

作者单位： 北京工商大学

项目金额： 25万元

中文摘要： 针对下一代集成电路硅晶片及芯片制造中材料表面原子级粗糙度、洁净度和低损伤的加工要求，为解决现有化学机械抛光（CMP）后清洗工艺中面临的纳米颗粒去除问题，研究清洗工艺条件下纳米颗粒行为规律，并分析其形成机制。通过改进基于荧光显微技术的纳米颗粒运动观测系统，对机械擦洗时纳米颗粒运动进行直接实验观测。利用原子力显微镜（AFM）、扫描电镜（SEM）等实验手段，对纳米颗粒与超光滑表面及清洗刷之间的相互作用进行测试，研究吸附、去除及运动等行为的力学条件。控制温度、湿度、pH值、表面活性剂以及溶解气体等因素，分析其对吸附作用力的影响。改进Cu及low-k介质清洗剂，从而有效控制其CMP后清洗中的纳米颗粒去除。结合流体力学、接触力学、界面物理化学、摩擦学等原理，分析纳米颗粒的行为规律，从微观角度探索纳米颗粒的粘附和去除机理，建立纳米颗粒运动的物理模型，为清洗工艺改进设计提供理论参考和实验依据。

中文关键词： 纳米颗粒；化学机械抛光后清洗；原子力显微镜；粘附；

英文摘要： The research is on the behavior and mechanisms of nano-particle removal in the post-CMP cleaning process. It is important for the preparation of ultraclean surface with the roughness, cleanliness and damage at atom scale in the fabrication of semiconductor devices. The particle movement during the brush scrubbing process is observed and traced by the flouresence technique. AFM is used for the measurement of the adhesion force between the particle and the ultra-smooth surface and SEM is used for the characterization of the nano-particle. The forces and conditions of adsorption and removal is analized. The effects of temperature, humidity, pH value, surfactant as well as dissolved gases and other factors are evaluated. An aqueous soluton will be investigated to well control the removal of nano-particle in post-CMP cleaning for Cu and low-k material. The model of nano-particle adhesion and removal are established through understanding of the micro mechanisms and the theory of hydrodynamics, contact mechanics, interface science and triboly to provide the theoretical reference and experimental basis for the improment of cleaning process.

英文关键词： Nano-particles；Post-CMP cleaning；AFM；adhesion；