强磁场磁控溅射的基础研究

项目名称： 强磁场磁控溅射的基础研究

项目编号： No.51277172

项目类型： 面上项目

立项/批准年度： 2013

项目学科： 电工技术

项目作者： 邱清泉

作者单位： 中国科学院电工研究所

项目金额： 88万元

中文摘要： 常规永磁磁控溅射装置由于需要在较高的气压和较窄的靶基板间距下放电，难以应用于制备高质量的光学薄膜和微纳加工工艺中的种子薄膜，超导磁控溅射装置靶表面的磁场比常规磁控溅射装置高一个数量级以上，因此可以在很低的气压和很长的靶基板间距下制备高质量薄膜。对于强磁场磁控溅射的放电机理、等离子体仿真和测试、磁体设计、镀膜工艺等基础问题进行研究，具有十分重要的理论和实际意义。本项目基于对强磁场磁控溅射机理的研究，将建立起一套采用高温超导线圈激磁的小型磁控溅射镀膜实验平台。进一步，本项目拟以制备Cu薄膜和ZnO薄膜为例，重点对磁场强度、气压、电压和靶基板间距等工作参数对等离子体特性的影响，以及等离子体特性对薄膜形貌和参数的影响展开研究，在此基础上对各工作参数的配合进行优化。

中文关键词： 高温超导；强磁场；磁控溅射；等离子体；放电

英文摘要： Conventional permanent-magnet magnetron discharge is hard to be used to deposit high-quality optical films and seed films in micro-nano machining technology, because of its higher pressrue and narrower target-substrate space. The HTS (high temperature superconductivity) magnetron sputtering apparatus could generate strong magnetic field which is one order higher than that of conventional magnetrons, therefore a lot of special films could be prepared in lower gas pressure and longer target-substrate space. The research of discharge mechanism, plasma simulation and measurement, magnet design and coating technology is of great theoretical significance and practical value to prepare high-quality film.Through the mechansim research of high field magnetron sputtering, a small-scale planar magnetron sputtering platform excited by HTS magnet will be built. Furthermore,taking preparation of Cu film and ZnO film for example, the influence of magnetic field intensity, gas pressure, cathode voltage and target-substrate space, etc. on plasma characteristics, and the influcence of plasma characteristics on film morpholoy and parameters are studied. Based on this, the matching of these operating parameters could be optimized.

英文关键词： high temperature superconductivity；high field；magnetron sputtering；plasma；discharge