基于ALD技术的纳米台阶高度样板的制备与测量溯源研究

项目名称： 基于ALD技术的纳米台阶高度样板的制备与测量溯源研究

项目编号： No.51505368

项目类型： 青年科学基金项目

立项/批准年度： 2016

项目学科： 机械、仪表工业

项目作者： 王琛英

作者单位： 西安交通大学

项目金额： 21万元

中文摘要： 随着纳米科学与技术的发展，准确的几何量测量成为研究器件和结构性能的先决条件，纳米台阶样板的制备和测量溯源成为研究热点之一。本课题研究原子层沉积结合湿法刻蚀制备高度为单原子层到1 nm台阶结构制备的理论和工艺可行性以及测量可靠性。通过研究原子层沉积工艺原理，分析高度分别为单原子层、1、2、3和4nm以及其它纳米量级台阶样板制备过程主要影响因素。利用多重分形方法，研究分析作为台阶上表面的薄膜表面形貌特征；对于通过湿法刻蚀薄膜获得的台阶结构，通过理论和实验分析刻蚀液、刻蚀时间对台阶下表面形貌的影响，优化工艺参数；并分析研究采用该工艺可以获得的最小台阶高度。通过建立台阶高度值与AFM探针形貌之间的蒙特卡洛模型，分析纳米台阶高度样板测量的不确定度。将石墨烯薄膜厚度及晶格键长作为标准，完成纳米台阶高度的比对测量；并将台阶高度样板与国内外测量机构进行溯源比对，为纳米标准样板的研究提供理论基础。

中文关键词： 纳米台阶；AFM探针；ALD；技术；高度值；表面粗糙度

英文摘要： With the development of nano science and nano technology, the accurate geometric measurement has become the prerequisite to research the performance of the devices and the structures. The fabrication and characterization of nanostep template has become one of the research focus.This research is about the process feasibility and the measurement reliability of nanostep fabricated by atomic layer deposition technology combines wet etching process, of which height is from a single atomic layer to 4 nm. With the study of the principle of atomic layer deposition technology, the main influence factors of the preparation process of nanostep of the single atomic layer, 1nm, 2nm, 3nm and 4nm have been analyzed. The properties of film surface morphology as the upper surface of nanostep have been researched and analyzed by multi-fractal method. For the nanostep structure obtained by wet etching film, analyze the impact of the etching solution and etching time to the bottom surface morphology, then optimize the process parameters，and analyze the minimum height nanostep can be fabricated by this process. By establishing Monte Carlo model between the step height value and the AFM probe topography, the measurement uncertainty of nanostep is analyzed. And set the monolayer thickness of class graphene as standard And set the monolayer thickness of class graphene as standard, complete the contrast measurements of nanostep heights. The value of the nanostep height should be trace to the domestic and international institutions in order to prove its accuracy and reliability. It will be the foundation for the study of sub-nanometer standard template.

英文关键词： nanostep;AFM probe;ALD technology;height value;surface roughness