脉冲CO2激光驱动的EUV光源研究

项目名称： 脉冲CO2激光驱动的EUV光源研究

项目编号： No.61078024

项目类型： 面上项目

立项/批准年度： 2011

项目学科： 轻工业、手工业

项目作者： 陆培祥

作者单位： 华中科技大学

项目金额： 18万元

中文摘要： 极紫外光刻技术（EUVL）被认为是下一代光刻技术的最主要候选技术，EUV 光源是EUVL 的关键技术之一。近年来该领域的研究与发展趋势表明采用CO2 激光等离子体作为EUV 光源已经显示出巨大优势，可能是将来EUVL 设备的最佳光源。项目针对EUVL 设备需要的高转换效率、窄带宽、低碎屑和长寿命等需求，在国内提出采用脉冲CO2 激光驱动Sn 等离子体获得高转换效率、低碎屑EUV 光源的方案。通过数值模拟与理论分析，深入理解CO2 激光驱动等离子体辐射EUV 的物理机制，优化实验参数与靶的设计，实现13.5nm 处2%带宽高转换效率、高清洁度EUV 光源输出。项目的开展将有助于我国在EUVL 研究领域取得自主知识产权的成果并赶上国际同期水平。

中文关键词： 极紫外光刻；CO2激光；激光等离子体（LPP）；EUV 光源；Sn 靶

英文摘要： Extreme ultraviolet lithography (EUVL) is considered the main candidate for next generation lithography technology, EUV light source is one of the key technologies EUVL。In recent years the research and development trends of this field show that it has great advantage for EUV light source based on the CO2 laser-produced plasma, which can be the best light source of the EUVL devices in the future. In view of the EUVL equipment need for high conversion efficiency, narrow bandwidth, low-demand debris, long life and so on, a Scheme based on pulsed CO2 laser driven Sn plasma is proposed for producing high conversion efficiency and low-debris program EUV light source in the project. Based on the simulation and the theoretical analysis, we optimize the experimental parameters and the design of the target and finally achieve the high-CE, clean EUV source. This project will help domestic abtain independent intellectual property rights in the EUVL research and catch up with the international level.

英文关键词： Extreme ultraviolet lithography；CO2 laser；laser-produced plasma; EUV source; Sn target