光学元件亚表面缺陷光声成像机理及检测方法

项目名称： 光学元件亚表面缺陷光声成像机理及检测方法

项目编号： No.61575119

项目类型： 面上项目

立项/批准年度： 2016

项目学科： 无线电电子学、电信技术

项目作者： 于瀛洁

作者单位： 上海大学

项目金额： 16万元

中文摘要： 亚表面缺陷在光学元件、晶片、陶瓷工件、功能梯度材料工件等都有存在。对于这些工件亚表面缺陷的分析是提升和保证精密表面加工质量的重要一环。光学元件亚表面缺陷是指由于接触式加工过程中所产生、存在于表面以下几百纳米至几百微米范围内的杂质、划痕和微裂纹等缺陷的现象。由于光学元件亚表面缺陷特殊的倒树状及较深的纵向延伸结构，使非破坏性的、无损的亚表面缺陷三维分布检测一直没有得到较好解决。 项目提出了具有光学分辨率尺度、表面下微米到百微米深度的光学元件亚表面缺陷光声成像检测方法，研究光学元件亚表面缺陷光声成像机理，探讨亚表面缺陷检测方法，以实现微米级的亚表面缺陷检测空间分辨率为基本目标，重点突破亚表面缺陷微弱光声信号的采集和处理问题、轴向分层实现方法问题等，实现亚表面缺陷空间分布的量化表征。成果将为光学元件加工工艺研究和元件使用过程状态分析提供一种无损检测手段。

中文关键词： 光学元件检测；亚表面缺陷；光声成像；层析重建；

英文摘要： Sub-surface defects are existed in the optical elements, wafers, ceramics, functionally gradient material workpieces and so on. Analysis of the subsurface defects is one important link to promote and ensure the precision surface machining quality.Sub-surface defects of optical devices are considered as the impurities, scratches and micro-cracks with depth from hundreds nanometers to hundreds micrometers under the surface generated during contacted producing process. In terms of its special structures of reverse tree and deep vertical extension, it is hard to develop a non-destructive detection method to detect 3-D sub-surface defect distribution. The project proposes to achieve sub-surface defect detection based on photoacoustic imaging technique with the scale of optical resolution and the depth of microns to a hundred of micron under the surface. It does research on photoacoustic imaging mechanism of subsurface defects and explores the sub-surface defect detection method. Using micron order’s spatial resolutions in detecting sub-surface defects as the basic target, the project will try to breakthrough the problem in acquiring and processing the weak photoacoustic signal of sub-surface defects and the problem of micron axial stratification resolution of the testing method. It hopes to realize the detection and

英文关键词： optical element detection；sub-surface defects；photoacoustic imaging；tomographic reconstruction；