磁控溅射类金刚石膜梯度诱导成核杂化机理研究

项目名称： 磁控溅射类金刚石膜梯度诱导成核杂化机理研究

项目编号： No.11304254

项目类型： 青年科学基金项目

立项/批准年度： 2014

项目学科： 数理科学和化学

项目作者： 陈青云

作者单位： 西南科技大学

项目金额： 28万元

中文摘要： 类金刚石膜秉承了金刚石众多的优异性能，在热沉、抗核加固，微电子等技术应用中具有重大的应用前景。低温、低能注入条件下成核是减小膜基间热失配应力梯度以适用规模化应用的重要手段，而目前类金刚石膜的实验和理论研究多基于高能量离子注入条件，对磁控溅射等较低能量注入条件下的成核机理缺乏认识。本项目拟采用磁控溅射制备和第一性原理模拟相结合的方法，重点研究低能离子注入条件下，过渡层中梯度分布的电荷对类金刚石膜杂化态诱导成核的影响机理。项目拟以硅为基底材料，石墨为靶材，考虑到硅和（类）金刚石的失配问题，在基底材料上逐步沉积晶格梯度匹配的过渡膜，同时利用掺杂技术在过渡层中形成的梯度电场，对类金刚石膜中杂化态的成核和生长姿态进行调节，最终实现高质量类金刚石膜的制备，该方法旨在提高膜材料与基底材料间的结合力，并保持类金刚石膜的优异性能，为规模化制备性能优异的类金刚石膜提供科学依据和技术支撑。

中文关键词： 类金刚石；磁控溅射；诱导成核；杂化机理；

英文摘要： Diamond-like carbon (DLC) films have widespread application in areas, such as heat sink, radiation hardening, micro-electromechanical devices because of its excellent performance. The main restriction for the full commercialization of DLC films is attributed to its low adhesion.In order to increase the adhesion of DLC films, low energy and low temperature nucleation techniques can be adopted. However, the nucleation mechanism is generally based on the high energy ion implantation conditions at present, lacking of adequate understanding of the low energy conditions. Combining magnetron sputtering fabrication with first principle theory, the project intends to foucs on the effect of gradient electric field on the oriented nucleation of DLC films. In order to match the DLC films with substrate, the transition films with the lattice constant gradient change be deposited. The nucleation and growth processes of DLC films were oriented by gradient electric field formed by doping technology in transition layers. The method aims to enhance the adhesion between the DLC films and the substrate, and maintain the excellent performance of DLC films. The project provides scientific basis and technical support for the preparation of DLC films with excellent performance.

英文关键词： Diamond-like carbon films；Magnetron sputtering；Oriented nucleation；Hybrid mechanisms；