全息离子束刻蚀同步辐射光栅微结构精密控制技术

项目名称： 全息离子束刻蚀同步辐射光栅微结构精密控制技术

项目编号： No.10875128

项目类型： 面上项目

立项/批准年度： 2009

项目学科： 金属学与金属工艺

项目作者： 徐向东

作者单位： 中国科学技术大学

项目金额： 41万元

中文摘要： 同步辐射光栅是指用于真空紫外及软X射线波段的同步辐射光束线中的一类光栅，是光栅单色仪的核心元件之一。该项基金的研究目标是探索全息光刻和离子束刻蚀过程中的光栅微结构演变，以其达到光栅微结构的精密控制。在基金的资助下，本项目研究取得如下主要成果： 1）解决了长条形光栅基底光刻胶涂布均匀性问题； 2）建立曝光监测和显影监测系统，实现了对曝光及显影过程的控制； 3）提出一种简单方便的利用天然氧化层作为硅各向异性刻蚀掩模，成功地制作出接近于理想锯齿槽型的闪耀光栅。光栅样品闪耀角为5 ，线密度1200线/毫米，闪耀面的均方根粗糙度约0.2nm，测量的绝对效率为53.7%，其相应的槽型效率为83.2%，与理论计算结果吻合的很好； 4）为新建角分辨光电子能谱光束线成功地研制出有效刻划面积大于120mm×mm的1200线/毫米Laminar硅光栅，测量结果表明分辨本领约11000，满足了光束线设计要求； 5）针对燃烧与火焰实验站中1米Seya-Namioka单色仪对光栅的需求，制作出1200线/毫米 Laminar光栅。同步辐射在线波长扫描结果表明，获得的实验结果与理论计算结果基本符合。

中文关键词： 同步辐射；衍射光栅；全息光刻；离子束刻蚀

英文摘要： Synchrotron radiation grating(SRG) is a type of diffraction grating used for VUV and soft x-ray region beamline, it is one of key elements in grating monochromator.The research goal of the found is to explore the evolution of grating profiles under holographic lithography and ion beam etchoing in order to accurate microstructure determination for SRG.Under this found, some main achievements have been achieved: 1)It is a vital step to deposit uniform photoresist coating onto long rectangular substrates in holographic lithography.The uniformity has been achieved by spin coating with the special designed chamber for long rectangular substrate. 2)A monitoring apparatus for latent image during exposure and for developing diffraction gratings have been set up.The relationship between the intensity of latent image and exposure dose and development has been investigated; 3)We present a simple and convenient method of controlling the profile of a blazed grating that consists of using native oxide layer as the mask of anisotropic etching to obtain near-ideal groove of sawtooth.By this technique, a 1200g/mm blazed grating was fabricated that had a blaze angle of 5.0 and smooth blaze facets of about 0.2nm rms.The grating sample was measured to blaze at wavelength of 135nm,where the peak measured absolute efficiency is 53.7% and the corresponding calculated groove efficiency is 83.2% in s polarization; 4)The laminar grating with groove density of 1200g/mm and active area large than 120mm×mm is fabricated for ARPES at NSRL.The spectral calibration and performance test are performed during the ARPES beamline early adjustment and test, the results show that the energy resolving power of about 11000,which meets the demand of design specifications; 5)To meet the need of 1 m Seya-Namioka monochromator for gratings in the combustion and flame endstation at NSRL,1200g/mm laminar gratings were succesfully fabricated. Synchrotron radiation wavelength scanning were performed at the exit slit of the combustion and flame endstation, the results indicate that agrees well with the calculated results.

英文关键词： Synchrotron radiation;diffraction grating;holographic lithography;ion beam etching