项目名称: 应用矢量成像模型的光源-掩模优化技术基础研究
项目编号: No.61204113
项目类型: 青年科学基金项目
立项/批准年度: 2013
项目学科: 信息四处
项目作者: 马旭
作者单位: 北京理工大学
项目金额: 25万元
中文摘要: 45nm-16nm浸没式光刻系统的分辨率增强技术是当前国际前沿课题。其中光源-掩模优化(source-mask optimization,简称SMO)是关键技术之一。对于45nm-16nm技术节点,标量成像模型已经无法精确描述高数值孔径浸没式光刻系统的成像过程,从而无法满足 SMO的精度要求。本项目应用课题组自主研发的矢量成像模型,研究和发展高成像精度的基于像素的SMO技术,通过对光源强度、偏振态和掩模拓扑结构的联合优化,探索提高SMO优化维度和光刻系统成像性能的有效途径及手段。本项目还将尝试并创新高效且收敛性好的解析优化算法,从而提高现有SMO技术的优化速度,并获得该问题的全局最优解。另外,本项目拟定针对45nm-16nm SMO技术中的光源、掩模可制造性问题,提出数学模型及评价函数,发展在SMO优化过程中提高光源、掩模可制造性的方法。最后,我们还将开发具有自主知识产权的光刻仿真软件。
中文关键词: 光源-掩模优化;分辨率增强技术;矢量成像模型;光学光刻;可制造性
英文摘要: Currently, the resolution enhancement technique (RET) becomes a cutting-edge research field for the 45nm-16nm immersion lithography, where the source-mask optimization (SMO) is one of the key techniques. For 45nm-16nm technology node, the scalar imaging model is not accurate to represent the image formation process of the hyper-NA immersion lithography systems, thus inadequate for the precision requirement of the SMO techniques. This project focuses on studying and developing pixel-based SMO approaches with high-precision based on a vector imaging model that was independently proposed by our research group. Through the co-optimization of source intensity, polarization and mask topology, the methods are explored to effectively increase the degree of optimization freedom in SMO procedure, and to improve the lithography imaging performance. The efficient and analytic optimization algorithms with superior convergence performance will be probed and innovated to speed up current SMO approaches, and to achieve the global optimal solution for the SMO problem. In addition, we plan to propose the mathematical model and evaluation function for the source and mask manufacturability in 45nm-16nm SMO techniques, then developing the effective methods to improve their manufacturability during the SMO procedure. Finally, the lit
英文关键词: source-mask optimization;resolution enhancement technique;vector imaging model;optical lithography;manufacturability