用离子注入方法制备光学晶体异质结构的机理研究

项目名称： 用离子注入方法制备光学晶体异质结构的机理研究

项目编号： No.51272135

项目类型： 面上项目

立项/批准年度： 2013

项目学科： 一般工业技术

项目作者： 卢霏

作者单位： 山东大学

项目金额： 70万元

中文摘要： 光学晶体异质结构将不同性质的光学单晶结合在一起，可以实现单一晶体无法实现的特殊性能，在光电集成和全光器件研究领域具有巨大的应用潜力。在获得高性能光学晶体异质结构的方法中离子注入或智能切割（smart cutting）方法具有独特的优势。然而这种方法在光学晶体上的应用还存在很多困难和挑战，对材料物理过程的研究和认识的缺乏，是限制这种方法应用的主要原因，而研究注入引起的缺陷和损伤的性质是至关重要的。本项目中我们将从多方面系统地研究离子注入在不同光学晶体中产生的缺陷和损伤的性质，明确光学晶体中缺陷和损伤的性质与实现晶片剥离之间的关系。揭示注入产生的缺陷微结构随晶体结构和实验条件变化的演变规律。建立利用控制离子注入和后处理实验条件获得光学单晶薄膜的方法。为离子注入剥离晶片在光学晶体材料上的应用提供理论依据，并以此为基础尝试在不同衬底材料上实现光学单晶薄膜的剥离和光学晶体异质结构的制备。

中文关键词： 光学晶体；离子注入；晶格缺陷与损伤；智能切割；异质结构

英文摘要： Optical crystal hetero-structure, which is constituted of the combination of different single crystal films together, can achieve many special performances that single crystal structure fails to obtain in optoelectronics devices , showing great potential in research and application of all-optical and optoelectronic integrated devices. Among all of the fabrication methods, ion implantation or smart cutting method has a unique advantage in access to high-performance optical crystal hetero-structures. However, there are still many difficulties and challenges in successfully obtaining a single crystal wafer using ion implantation, especially for many optical crystals. The major obstacle comes from the lack of understanding of physical processes of interaction between ion and host optical materials, which restricts the application of ion implantation in most of the optical crystals.Study on nature of implant-induced defects and damage is therefore critical. In this project we will study the mechanism of defects and damage in various different optical crystals induced by ion implantation, trying to find the relationship between defects or damage properties in crystal and application of smart cutting. We'll observe the microstructure of defects and reveal the evolution process of defect formation depending on experimen

英文关键词： optical Crystals；ion implantation；lattice damage and defects；smart cut；heterostructure