Large Language Models (LLMs) have transformed natural language processing, demonstrating impressive capabilities across diverse tasks. However, deploying these models introduces critical risks related to intellectual property violations and potential misuse, particularly as adversaries can imitate these models to steal services or generate misleading outputs. We specifically focus on model stealing attacks, as they are highly relevant to proprietary LLMs and pose a serious threat to their security, revenue, and ethical deployment. While various watermarking techniques have emerged to mitigate these risks, it remains unclear how far the community and industry have progressed in developing and deploying watermarks in LLMs. To bridge this gap, we aim to develop a comprehensive systematization for watermarks in LLMs by 1) presenting a detailed taxonomy for watermarks in LLMs, 2) proposing a novel intellectual property classifier to explore the effectiveness and impacts of watermarks on LLMs under both attack and attack-free environments, 3) analyzing the limitations of existing watermarks in LLMs, and 4) discussing practical challenges and potential future directions for watermarks in LLMs. Through extensive experiments, we show that despite promising research outcomes and significant attention from leading companies and community to deploy watermarks, these techniques have yet to reach their full potential in real-world applications due to their unfavorable impacts on model utility of LLMs and downstream tasks. Our findings provide an insightful understanding of watermarks in LLMs, highlighting the need for practical watermarks solutions tailored to LLM deployment.
翻译:大型语言模型(LLM)已彻底改变自然语言处理领域,在多样化任务中展现出卓越能力。然而,部署这些模型会带来与知识产权侵权及潜在滥用相关的重大风险,特别是在攻击者可能通过模仿模型窃取服务或生成误导性输出的场景下。我们特别关注模型窃取攻击,因其与专有LLM高度相关,并对模型安全性、商业收益及伦理部署构成严重威胁。尽管已有多种水印技术被提出以缓解此类风险,但学界与工业界在LLM水印技术的研发与部署方面进展如何尚不明确。为填补这一空白,我们旨在构建LLM水印的系统化框架,具体通过:1)建立LLM水印的细粒度分类体系;2)提出新型知识产权分类器,探究攻击与非攻击环境下水印对LLM效能的影响;3)分析现有LLM水印技术的局限性;4)探讨LLM水印的实际挑战与未来发展方向。通过大量实验,我们发现尽管相关研究成果前景可观,且领先企业与社区对部署水印给予高度重视,但由于现有技术对LLM模型效用及下游任务产生不利影响,这些技术在实际应用中尚未充分发挥其潜力。本研究为理解LLM水印技术提供了深刻见解,并强调需要针对LLM部署场景开发更具实用性的水印解决方案。