C/N/F离子在过渡金属后金属氧化物薄膜中的扩散机理研究

项目名称： C/N/F离子在过渡金属后金属氧化物薄膜中的扩散机理研究

项目编号： No.51472039

项目类型： 面上项目

立项/批准年度： 2015

项目学科： 一般工业技术

项目作者： 丁万昱

作者单位： 大连交通大学

项目金额： 85万元

中文摘要： 过渡金属后金属氧化物基透明导电(PTMO-TCO)薄膜易受C/N/F离子的扩散，影响其光电稳定性，因此研究C/N/F离子在薄膜中的扩散机理成为该领域研究热点。本项目利用低能C/N/F离子束与PTMO-TCO薄膜表面相互作用，模拟上述离子在薄膜中的扩散过程；利用XPS和EELS分析上述离子在非晶/晶界/晶格处扩散的区别；利用KFM和C-AFM分析上述离子的扩散对薄膜光电性能在截面法线方向的变化；以随机行走模型和有限厚度模型分别模拟上述离子在非晶/晶界/晶格处的扩散，根据XPS/EELS/KFM/C-AFM结果，确定两种模型各自的边界条件，并保证两种模型计算结果在边界处自洽吻合，最终形成完整的扩散理论模型。该研究可从实验和理论两方面揭示C/N/F离子在PTMO-TCO薄膜中的扩散机理，为研究并扩展PTMO-TCO功能薄膜的使用提供新思路。

中文关键词： 金属氧化物；透明导电薄膜；磁控溅射；界面和表面；界面结构

英文摘要： It is easy for C/N/F ions to diffuse into the post-transition metal transparent conducting oxide (PTMO-TCO) films, which could influence the electro-optical property of films seriously. So it is important to research the diffusion mechanism of C/N/F ion in PTMO-TCO films, both for fundamental research and practical application. In the project, the C/N/F ion beam with low energy is used to react with the surface of PTMO-TCO films, by which the diffusion of ions in films could be simulated. The XPS and EELS techniques are used to study the diffusion of C/N/F ion at amorphous, grain boundary, and grain. The KFM and C-AFM techniques are used to study the influence of C/N/F ion diffusion on the electro-optical property along the normal direction of surface. The random walk model and finite thickness model are used to calculate the C/N/F ion diffusion at amorphous, grain boundary, and grain. Based on the results of XPS, EELS, KFM, and C-AFM, the boundary conditions of above two models could be deduced, by which the two model results at the boundary could be self-consistent and chimed each other. Through the project, the diffusion mechanism of C/N/F ion in PTMO-TCO films could be deduced by the analysis of experiment result and theory model.

英文关键词： metal oxide;transparent conducting film;magnetron sputtering;surface and interface;interface structure