基于介电泳效应的抛光新方法研究

项目名称： 基于介电泳效应的抛光新方法研究

项目编号： No.51275476

项目类型： 面上项目

立项/批准年度： 2013

项目学科： 机械、仪表工业

项目作者： 邓乾发

作者单位： 浙江工业大学

项目金额： 80万元

中文摘要： 针对传统抛光过程中，加工区域抛光液驻留时间短、利用率低，导致加工效率低、抛光液无效损耗高等问题，提出了一种基于基于介电泳效应的抛光新方法：利用非均匀电场使加工区域中的抛光液及其中的磨粒发生极化，表面产生感应电荷的抛光液和磨粒受到非均匀电场的介电泳力作用，向电场的极板移动，并被吸咐在极板附近的抛光垫上，抑制了离心力对抛光液及磨粒甩出作用，延长抛光液和磨粒在加工区域的驻留时间，增强了抛光介质对工件的去除作用，提高了抛光效率。同时，减少了抛光液和磨粒甩出造成的无效损耗，降低了生产成本。本项目研究揭示介抛光过程中介电泳效应的作用机理，分析非均匀电场条件下抛光液和磨粒的运动学和力学特性，研究加工过程中的工件材料去除机理，探索介电泳效应定量控制的关键因素和方法，构建加工实验平台，优化加工方式及工艺参数，发展了一种高效、低成本的抛光新方法，对丰富超精密磨粒加工技术具有重要的科学意义和工程应用价值。

中文关键词： 非均匀电场；介电泳；抛光；高效；

英文摘要： A novel polishing method that is based on dielectrophoretic(DEP) effect is proposed to tackle problems often associated with traditional polishing process, such as short dwell time of abrasive within polishing zone, low utilization of abrasive, low machining efficiency, and high non-polishing consumption of abrasive. The novel method employes non-uniform electric field to polarize polishing slurry and abrasive within the polishing zone. Slurry and abrasive with surface induced electric charge move toward the electrode under the DEP force of non-uniform electric field and adsorb on a polishing pad near the electrode. It suppresses the thrown-out effect of slurry and abrasive due to centrifugal force during polishing; extends the dwell time of slurry and abrasive within the polishing zone; enhances the material removal effect of polishing media; and improves polishing efficiency. It also reduces non-polishing slurry and abrasive consumption due to thrown-out effect and reduces manufacturing cost. This project will unveil the mechanism of DEP effect in polishing; analyze the characteristics of kinematics and dynamics of slurry and abrasive under non-uniform electric field; study work piece material removal mechanism during machining process; explore key factors and methods for quantitatively controlling DEP effec

英文关键词： Non-uniform electric field；dielectrophoresis；polishing；efficiency；