二维原子氮化硼涂层的成核位点控制及其电化学防腐机理研究

项目名称： 二维原子氮化硼涂层的成核位点控制及其电化学防腐机理研究

项目编号： No.21473209

项目类型： 面上项目

立项/批准年度： 2015

项目学科： 分析化学

项目作者： 王钰

作者单位： 中国科学院过程工程研究所

项目金额： 90万元

中文摘要： 随着二维原子晶体材料的深入研究及其制备方法学的发展，很多传统工业难以实现的工艺技术问题将获得创新性的解决思路。化学气相沉积法（CVD）制备的二维原子氮化硼涂层具有独特的分子结构、优异的物理性能，并且能与金属衬底形成完美的耦合包覆，将在金属腐蚀与防护领域中获得广泛的应用。本项目拟借助喷墨打印技术控制成核点位置，通过优化等离子体增强CVD过程工艺参数，实现二维原子h-BN涂层材料在金属衬底上可控生长。着重研究生长成连续的薄膜材料晶界分布与等离子体增强CVD参数的控制关系，揭示溶液体系中离子在h-BN晶界处发生的物理过程和电化学反应，总结二维h-BN保护金属材料的热力学影响因素，阐明二维原子涂层防腐失效过程动力学，结合新型二维原子晶体材料的优异物理和化学特性，发展长期稳定的金属防腐新方法和新技术。

中文关键词： 二维原子晶体材料；六方氮化硼；成核控制；金属电化学；腐蚀与防护

英文摘要： With the deep study of two-dimensional atomic crystal materials and the development of their preparation methodology, many traditional industries elusive technology issues will achieve innovative solutions. The two-dimensional atomic boron nitride coating which is prepared by chemical vapor deposition method has a unique molecular structure and excellent physical properties, perfectly coupling with metal substrate. These advantages will be widely applied in the field of metal corrosion and protection. In this project, we will control the nucleation sites by using inkjet printing technology. Two dimensional atomic h-BN film can be controllable grown on metal substrate by optimizing process parameters of plasma enhanced CVD. We will i) focus on the relationship between the grain boundary distribution of h-BN film and its growth parameters by PECVD process, ii) reveal the ionic aqueous system physical processes at the grain boundaries and the electrochemical reactions, iii) summarize the thermodynamic factors of long-term protecting metal materials by two-dimensional h-BN film, iv) illuminate the anticorrosion failure dynamics of two-dimensional atomic coating, v) combining the excellent physical and chemical properties of two-dimensional atomic crystal materials, develop some new methods and technologies for long-term protecting metals.

英文关键词： two-dimensional atomic crystal material;h-BN;Nucleation control;metal electrochemistry;corrosion and protection